Адрес: 208.ta-shin rd. lu chu hsiang. tao yuan hsien. taiwan
Телефон: +886-3-3137017
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1.Introduction,,2.Lithographic Systems and Illumination ,,3.Resist Technology,,4.Modeling & Simulations,,5.Resolution Enhancement Technology,,6.Critical Issues and Solutions ,,7.Imaging the Future
1. Motive of low-k materials,,2. Kinds of low-k materials,,3. Mechanism of low-k materials,,4. Study on porous SiO2 (Sol-gel),,5. Integration between low-k and Cu,,6. Conclusion
1. Motive of low-k materials,,2. Kinds of low-k materials,,3. Mechanism of low-k materials,,4. Study on porous SiO2 (Sol-gel),,5. Integration between low-k and Cu,,6. Conclusion
1. Motive of low-k materials,,2. Kinds of low-k materials,,3. Mechanism of low-k materials,,4. Study on porous SiO2 (Sol-gel),,5. Integration between low-k and Cu,,6. Conclusion
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