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Producer information

Company:
RAYMOND MANAGEMENT CONSULTANT CO; LTD.

Address:
208.ta-shin rd. lu chu hsiang. tao yuan hsien. taiwan

Phone:
+886-3-3137017

RF technology

1.introduction to microwave and wireless communication.,,2.Microwave devices: Bipolar, ,3.Microwave device modelling, ,4.CMOS RF IC design,,5.Microwave testing

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Other goods of this manufacturer :

RF technology
	1.introduction to microwave and wireless communication.,,2.Microwave devices: Bipolar, ,3.Microwave device modelling, ,4.CMOS RF IC design,,5.Microwave testing

SPC
	(1) ISPC (2) R s P P (3) s { O R (4) H ISPC @ k (5) s { @ k

thin film technology
	A. Metal Deposition:,,B. Dielectric Deposition:,,C. Si Epitaxy:

thin film technology
	A. Metal Deposition:,,B. Dielectric Deposition:,,C. Si Epitaxy:

thin film technology
	A. Metal Deposition:,,B. Dielectric Deposition:,,C. Si Epitaxy:

time management
	1. B 2. A z H 3. W 4. z T [ N 5. z k 6. ~ [ D _ 7. G ~ [ 8. T ~ [ 9.

8D REPORT
	D w q G p o { D P i D N T M D K j B J n \| b D R 8D ` N p 8D Report C Q & A

basic Principles of Plasma
	A. Principles of Plasma Generation, ,,B. Principles of Collisions,,C. Plasma Potential and Sheath,,D. RF Plasma and Self-bias,,E. Debye Shielding,,F. Plasma Oscillation,,G. Effect of Magnetic Field o

basic Principles of Plasma
	A. Principles of Plasma Generation, ,,B. Principles of Collisions,,C. Plasma Potential and Sheath,,D. RF Plasma and Self-bias,,E. Debye Shielding,,F. Plasma Oscillation,,G. Effect of Magnetic Field o

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